Utilizing complex oxide substrates to control carrier concentration in large-area monolayer MoS2 films

X. Zheng, E. Gerber, J. Park, D. Werder, O. Kigner, E.-A. Kim, S. Xie, and D. G. Schlom

https://doi.org/10.1063/5.0038383

Wednesday, March 3, 2021